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Facility in MNEDL

▶  Synthesis

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Fume Hude 1

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Fume Hude 2

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Chemical Glove Box

▶  Spectroscopy & Characterization

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UV-vis-NIR Spectroscopy

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Photoluminescence Spectroscopy

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NIR Photoluminescence Spectroscopy

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Zeta Potential

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Mask Aligner

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Fluorescence Microscopy

▶  Device Fabrication

< Sample Preparation in Lab >

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Thermal Evaporator

Microscope & 

2D transfer system

Glove Box

< DGIST CCRF-FAB (Home page) >

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​1. Photo Room​​

Ebeam/Photo-lithography System

Auto/manual-Spin Coating

2. Etching Room

Reactive Ion Etching System​ (RIE)

Wet station for etching

3.Deposition Room

Ebeam Evaporator

Atomic Layer Deposition (ALD)

Device Clean Room

(Clean Room Class 100~1000)

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HR-TEM

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Photo-lithography

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Ebeam-lithography

▶  Measurement System

Photocurrent & PL mapping

Photocurrent & PL mapping

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Solar Simulator

Photocurrent I-V in Glovebox

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Incident Photon to Charge Carrier Efficiency (IPCE) Measurement 

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